The low-cost scalable methodology suggested in Nanotechnology by the ICN2 Phononic and Photonic Nanostructures Group demonstrated an improvement in ordering of the nanodot lattice of up to 50%.
The methodology consists on in situ solvent-assisted nanoimprint lithography of block copolymers (BCPs), a technique which combines a top-down approach – nanoimprint lithography – with a bottom-up one – self-assembled block copolymers (bottom-up). The process is assisted with solvent vapors to facilitate the imprint and simultaneous self-assembly of high Flory-Huggins parameter BCPs, the ones that yield sub-15 nm size features, in what has been called solvent vapors assisted nanoimprint lithography (SAIL).
The results obtained with SAIL demonstrated an improvement in ordering of the nanodot lattice of up to 50%. It is a low cost, scalable and fast technique which brings self-assembled BCPs closer to their industrial application. These versatile materials are very interesting for applications such as storage devices, nano-electronics, low-k dielectrics or biochemical applications.