The Nanotechnology Unit of the Nanomaterials and Nanotechnology Center was inaugurated on July 2005, and it is located at the Severo Ochoa building of the Scientific - Technical Services in the “Campus del Cristo” of University of Oviedo.
The Nanotechnology Unit offers a wide range of nanofabrication services for nanostructured materials and devices and is focused on two main areas:
• Fabrication of micro and nanostructures using optical and electron beam lithography techniques
• Characterization of micro-and nanostructures at the nanoscale using scanning microscopy techniques.
Scanning Probe Microscopy
• Scanning Tunneling Microscopy (STM) with pseudo-atomic resolution on metallic surfaces.
• Atomic Force Microscopy (AFM): characterization of the roughness and detection of up to monoatomic steps on metallic or insulating surfaces, observation of biological samples, and characterization of the solid-liquid interface in liquid cell.
• Magnetic Force Microscopy (MFM) for the observation of magnetic domains.
• Lithography by local oxidation on Si substrates.
Nanotec Scanning Probe Microscope
Definition of circuits and chips in a clean room ambient, with lateral dimensions as small as 1 micron, by ultraviolet radiation of 365 nm and 400 nm.
Quintel EXPO line 4k6 Mask Aligner for Optical Lithography
Electron Beam Lithography
Definition of nanostructures or arrays of nanostructures with lateral sizes as small as 20 nm, on substrates and circuits.
LEO EVO 60 Scanning Electron Microscope with a Raith Elphy Plus electronic lithography system
Reactive Ion Etching and Ion Beam Etching
Reactive Ion Etching (RIE) and Ion Beam Etching (RIBE) to transfer the nanostructures defined by lithography. Plasma energy: 30 - 1000 eV
Kenosistec RIE-RIBE KP 600 PBS system